Science
KAIST's Billion-Grit Nano Sandpaper Polishes Chips to Atomic Smoothness
A carbon-nanotube-based abrasive achieves over one billion grit, smoothing semiconductor surfaces to within a few atoms while eliminating toxic slurry.
Key Takeaways
- KAIST develops carbon nanotube-based nano sandpaper with 500,000 times the abrasive density of commercial sandpaper
- The solid-state pad achieves single-digit nanometer surface finishes for semiconductor wafer polishing
- The technology could replace messy liquid CMP slurries as chips push toward sub-nanometer manufacturing tolerances
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